- vertical etching
- анізотропне травлення
English-Ukrainian dictionary of microelectronics. 2013.
vertical etching
Смотреть что такое "vertical etching" в других словарях:
Etching (microfabrication) — Etching tanks used to perform Piranha, Hydrofluoric acid or RCA clean on 4 inch wafer batches at LAAS technological facility in Toulouse, France Etching is used in microfabrication to chemically remove layers from the surface of a wafer during… … Wikipedia
vertical anisotropic etching isolation — izoliavimas stačiai anizotropiškai ėsdintais grioveliais statusas T sritis radioelektronika atitikmenys: angl. vertical anisotropic etching isolation vok. Isolation mittels vertikaler anisotroper Ätzgraben, f rus. изоляция канавками,… … Radioelektronikos terminų žodynas
vertical anisotropic etching — stačiasis anizotropinis ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. vertical anisotropic etching vok. vertikales anisotropes Ätzen, n rus. вертикальное анизотропное травление, n pranc. décapage vertical anisotrope, m … Radioelektronikos terminų žodynas
Vertical-cavity surface-emitting laser — The vertical cavity surface emitting laser (VCSEL; [v ɪxl] ) is a type of semiconductor laser diode with laser beam emission perpendicular from the top surface, contrary to conventional edge emitting semiconductor lasers (also in plane lasers)… … Wikipedia
Deep reactive-ion etching — (DRIE) is a highly anisotropic etch process used to create deep penetration, steep sided holes and trenches in wafers, with aspect ratios of 20:1 or more. It was developed for microelectromechanical systems (MEMS), which require these features,… … Wikipedia
Dry etching — refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of ions (usually a plasma of reactive gases such as fluorocarbons, oxygen, chlorine, boron trichloride; sometimes… … Wikipedia
Reactive-ion etching — (RIE) is an etching technology used in microfabrication. It uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High energy ions from the plasma… … Wikipedia
Isotropic etching — In semiconductor technology isotropic etching is non directional removal of material from a substrate via a chemical process using an etchant substance. The etchant may be a corrosive liquid or a chemically active ionized gas, known as a… … Wikipedia
Reactive-ion etching — Gravure ionique réactive La gravure ionique réactive ou gravure par ions réactifs très souvent appelée par son acronyme anglophone, RIE (pour Reactive Ion Etching), est une technique de gravure sèche des semi conducteurs. Il s agit d une… … Wikipédia en Français
Reactive Ion Etching — Gravure ionique réactive La gravure ionique réactive ou gravure par ions réactifs très souvent appelée par son acronyme anglophone, RIE (pour Reactive Ion Etching), est une technique de gravure sèche des semi conducteurs. Il s agit d une… … Wikipédia en Français
isolation par rainures formées par décapage vertical anisotrope — izoliavimas stačiai anizotropiškai ėsdintais grioveliais statusas T sritis radioelektronika atitikmenys: angl. vertical anisotropic etching isolation vok. Isolation mittels vertikaler anisotroper Ätzgraben, f rus. изоляция канавками,… … Radioelektronikos terminų žodynas
